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U. S. Eyes $150M Investment in xLight for Potential EUV Laser . . . U S government backs xLight with $150 million for EUV innovation The investment targets creating a U S -based laser system to rival ASML’s supply chain dependencies This initiative supports reviving Moore’s Law and reducing reliance on foreign semiconductor tech, with xLight aiming for a prototype by advancing domestic lithography capabilities Discover how the U S government’s $150
US to invest $150m in xLight for next-gen chip manufacturing xLight is collaborating with US national laboratories on a prototype designed to integrate with tools from ASML or prospective rivals Officials say the investment is meant to catalyse domestic laser-source innovation that could eventually diversify suppliers in the EUV ecosystem and improve energy efficiency across fabs The US Department of Commerce said it intends to invest up to $150